Embossed fill settings can be controlled in a similar way to motif fill settings, both via the Object Properties docker and interactively on screen. The docker allows you to control pattern size, spacing, and orientation by the same settings as motif fill. It also allows you to control the stitch density via Stitch values.
Adjust pattern size via the Width and Height fields. The scaling lock maintains aspect ratio. Use the Angle setting to orientate the pattern within the shape.
Column and row spacing settings determine distance between grid lines. Patterns are placed at intersection points – the center of each pattern coincides with an intersection.
You can vary the pattern by applying offset settings to rows and/or columns. If both offsets are set to ‘0’, grid lines are perfectly vertical and horizontal. As a rule, it only makes sense to use values between 0 and half the pattern size. For example, if the pattern is 8 mm, select row and column offsets between 0 mm and 4 mm.